Scientists create self-cleaning fabric
10/10/2011
Chemists at the University of California at Davis have said they have found a way of producing clothing that cleans itself when exposed to light.
Ning Liu, a doctoral student at UC Davis, worked with textile chemists Gang Sun and Jing Zhu to develop a method that incorporates a compound (2-AQC) into cotton fabrics. When exposed to light, it produces reactive oxygen species such as hydrogen peroxide that kill bacteria and break down toxins.
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